ECE411_CMOS

Silicon Nitride is used in modern technologies

• for LOCOS

• As a good masking layer

• to form spacers

• as a gate

Trench are filled by oxide through

• CVD

• PVD

• Wet oxidation

The bulk connection of the NMOS is implanted with

• the source and drain of the PMOS

• The source and drain of the NMOS

• The bulk connection of the PMOS

The mask of PMOS VT adjust

• is always the same as the NWELL mask

• is sometimes the same as the NWELL mask

• is the same as the NMOS VT adjust

The fins of the FinFET are implemented by

• SADP

• wet etching

• RIE etching