SEMICONDUCTOR DEVELOPMENT
Authored by GG SQUADE
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University
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5 questions
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1.
MULTIPLE CHOICE QUESTION
30 sec • 3 pts
What Year was the first IC Device created?
1954
1961
1958
1940
2.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
What process creat three-dimensional image on semiconductor substrate?
3D-printing
Lithography
Welding
Electroplating
3.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
What Year what the first IC product created?
1958
1951
1954
1961
4.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
What are "clean rooms" used for in semiconductor manufacturing?
To store wafers before processing
specially designed facilities that provide a controlled environment with a low level of airborne particles
To perform stress tests on semiconductors
To house lithography machines only
5.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
What is the primary purpose of wafer cleaning in semiconductor manufacturing?
To polish the wafer surface for better aesthetics
removes contaminants from the wafer surface. These contaminants can include particles, organic materials, and metal ions.
To add additional layers to the wafer
To etch patterns into the wafer
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