SEMICONDUCTOR DEVELOPMENT

What Year was the first IC Device created?

• 1954

• 1961

• 1958

• 1940

What process creat three-dimensional image on semiconductor substrate?

• 3D-printing

• Lithography

• Welding

• Electroplating

What Year what the first IC product created?

• 1958

• 1951

• 1954

• 1961

What are "clean rooms" used for in semiconductor manufacturing?

• To store wafers before processing

• specially designed facilities that provide a controlled environment with a low level of airborne particles

• To perform stress tests on semiconductors

• To house lithography machines only

What is the primary purpose of wafer cleaning in semiconductor manufacturing?

• To polish the wafer surface for better aesthetics

• removes contaminants from the wafer surface. These contaminants can include particles, organic materials, and metal ions.

• To add additional layers to the wafer

• To etch patterns into the wafer