Lithography

Lithography

University

8 Qs

quiz-placeholder

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Lithography

Lithography

Assessment

Quiz

Education

University

Hard

Created by

AFIFAH ALI

Used 17+ times

FREE Resource

8 questions

Show all answers

1.

MULTIPLE CHOICE QUESTION

20 sec • 1 pt

Which of the following lithography process does not use PMMA as the resist?

X-Ray Lithography

Electron Beam Lithography

Optical Lithography

Ion Beam Lithography

2.

MULTIPLE CHOICE QUESTION

20 sec • 1 pt

The light that used in optical lithography printing is:

X-ray light

Ultraviolet light

Gamma rays light

Laser light

3.

MULTIPLE CHOICE QUESTION

20 sec • 1 pt

Which of the following is NOT the exposure method in optical lithography?

Contact Printing

Proximity Printing

Projection Printing

Pressure Printing

4.

MULTIPLE SELECT QUESTION

30 sec • 1 pt

Which of the following are the two sources of light for X-Ray Lithography?

Electron Impact

Synchrotron

Thermionic Emitters

Photon Emitters

Field Emitters

5.

MULTIPLE SELECT QUESTION

45 sec • 1 pt

Which of the process below can be performed without using a mask?

Photolithography

Electron beam lithography

Ion beam lithography

X-Ray lithography

6.

MULTIPLE CHOICE QUESTION

20 sec • 1 pt

Below are the non ideal effect of electron beam lithography EXCEPT:

Stitching

Backscattering

Proximity effect

Thin lens

7.

MULTIPLE CHOICE QUESTION

20 sec • 1 pt

Media Image

This picture showing the process of the light sourcing for Ion Beam Lithography. The name of the process is:

Gas discharge ion

Liquid metal ion

Synchrotron

Electron impact

8.

MULTIPLE CHOICE QUESTION

20 sec • 1 pt

Media Image

This picture showing the stitching problem. What is the cause for this type of stitching ?

Over exposure

Under exposure

Shear error

Proximity contact