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Photolithography

Authored by Sakon Rahong

Science

University

10 Questions

Used 5+ times

Photolithography
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1.

MULTIPLE CHOICE QUESTION

30 sec • 1 pt

What wavelength is used in Extreme Ultraviolet (EUV) lithography?

193 nm

355 nm

13.5 nm

100 nm

2.

MULTIPLE CHOICE QUESTION

30 sec • 1 pt

In soft lithography, which elastomer is commonly used for making molds?

PVC

PDMS

Polystyrene

Polyethylene

3.

MULTIPLE CHOICE QUESTION

30 sec • 1 pt

Which of the following techniques is associated with maskless lithography?

Direct Laser Writing

Microcontact Printing

Micromolding

Replica Molding

4.

MULTIPLE CHOICE QUESTION

30 sec • 1 pt

What is the primary purpose of using a spin coater in photolithography?

Exposure

Developing

Etching

Coating Photoresist

5.

MULTIPLE CHOICE QUESTION

30 sec • 1 pt

Which gas is typically used as the basis for generating EUV light?

Helium

Argon

Xenon

Tin

6.

MULTIPLE CHOICE QUESTION

30 sec • 1 pt

In maskless lithography, what is used to project the pattern onto the substrate?

A fixed mask

A Digital Micromirror Device (DMD)

An Elastomeric Stamp

A Mechanical Printer

7.

MULTIPLE CHOICE QUESTION

30 sec • 1 pt

What property of PDMS makes it suitable for soft lithography processes with UV exposure?

Electrical Conductivity

Optical Transparency

Thermal Conductivity

Magnetic Permeability

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