Photolithography

Quiz
•
Science
•
University
•
Hard
Sakon Rahong
Used 5+ times
FREE Resource
10 questions
Show all answers
1.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
What wavelength is used in Extreme Ultraviolet (EUV) lithography?
193 nm
355 nm
13.5 nm
100 nm
2.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
In soft lithography, which elastomer is commonly used for making molds?
PVC
PDMS
Polystyrene
Polyethylene
3.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
Which of the following techniques is associated with maskless lithography?
Direct Laser Writing
Microcontact Printing
Micromolding
Replica Molding
4.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
What is the primary purpose of using a spin coater in photolithography?
Exposure
Developing
Etching
Coating Photoresist
5.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
Which gas is typically used as the basis for generating EUV light?
Helium
Argon
Xenon
Tin
6.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
In maskless lithography, what is used to project the pattern onto the substrate?
A fixed mask
A Digital Micromirror Device (DMD)
An Elastomeric Stamp
A Mechanical Printer
7.
MULTIPLE CHOICE QUESTION
30 sec • 1 pt
What property of PDMS makes it suitable for soft lithography processes with UV exposure?
Electrical Conductivity
Optical Transparency
Thermal Conductivity
Magnetic Permeability
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