SURE Trust - Integrated VLSI(G2) Quiz 1 -

A twin tub CMOS process used to manufacture integrated circuits has:

• None of these

• Both N-Well and P-Well

• P-Well

• N-Well

Metallic Grade Silicon (MGS) used to manufacture Electronics Grade Silicon (EGS) is:

• 90 % pure

• 98 % pure

• 99.999 % pure

• None of these

In lithography, on exposure to ultraviolet light ( UV Light ) a negative photoresist:

• Dissolves

• Polymerizes

• Evaporates

• None of these

Electronic Grade Silicon (EGS) used to make silicon wafers is:

• 90 % pure

• 98 % pure

• 99.999 % pure

• None of these

Gate oxide of a MOSFET is made of:

• Silicon

• Silicon Dioxide

• Silicon Nitride

• None of these

The bulk terminal of the NMOS transistor in a CMOS inverter is connected to:

• VDD

• VSS

• Either of VDD or VSS

• None of these

In a CMOS process, resistors can be made using:

• Polysilicon

• N Well

• N Type and P Type diffusions

• All of these

Oxidation of silicon to form silicon dioxide can be done using:

• Dry oxidation method

• Wet oxidation method

• Both

• None

In a CMOS process N Well and N Type and P Type diffusions can be formed using:

• Diffusion

• Ion Implantation

• Both

• None

In a CMOS process, capacitors can be formed using:

• Two layers of polysilicon with oxide in between

• Two layers of metal with oxide in between

• MOSFET biased and used as a capacitor

• All of these