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WorksheetsVLSI DESIGN QUIZ
Total questions: 13
Worksheet time: 6mins
The gate region consists of ____________
a) insulating layer
b) conducting layer
c) lower metal layer
d) p type layer
In CMOS fabrication, nMOS and pMOS are integrated in same substrate.
a) true
b) false
Which model is used for scaling?
a) constant electric scaling
b) constant voltage scaling
c) constant electric and voltage scaling
d) constant current model
In enhancement mode, device is in _________ condition.
a) conducting
b) non conducting
c) partially conducting
d) insulating
MOS transistor structure is ____________
a) symmetrical
b) non symmetrical
c) semi symmetrical
d) pseudo symmetrical
In MOS transistors _______________ is used for their gate.
a) metal
b) silicon-di-oxide
c) polysilicon
d) gallium
Enhancement mode device acts as ____ switch, depletion mode acts as _____ switch.
a) open, closed
b) closed, open
c) open, open
d) close, close
The photoresist layer is exposed to ____________
a) Visible light
b) Ultraviolet light
c) Infra red light
d) LED
The ______ is used to reduce the resistivity of poly silicon.
a) Photo resist
b) Etching
c) Doping impurities
d) None of the mentioned
Consider a MOS structure with equilibrium Fermi potential of the doped silicon substrate is given as 0.3eV. Electron affinity of Si is 4.15eV and metal is 4.1eV. Find the built in potential of the MOS system.
a) 0.6eV
b) 0.8eV
c) 0.9eV
d)-0.9eV
Which color is used for polysilicon is stick diagram?
a) brown
b) red
c) white
d) orange
Inversion layer in n channel enhancement mode consists of excess of ____________
a) positive carriers
b) negative carriers
c) both in equal quantity
d) neutral carriers
Which is used for the interconnection from source and drain in nMOS or pMOS ?
a) boron
b) oxygen
c) aluminium
d) silicon
