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Round 2 quiz, topic:- VLSI

Total questions: 15

Worksheet time: 8mins

Name
Class
Date
1.

In CMOS technology, the main reason for using a p-well or n-well process instead of a twin-tub process is?

a)

Reduced latch-up susceptibility

b)

Better control of threshold voltage and body effect

c)

Simpler fabrication steps

d)

Reduced junction capacitance

2.

The short-channel effect in MOSFETs primarily results in?

a)

Increased threshold voltage

b)

Reduced subthreshold slope

c)

Drain-induced barrier lowering

d)

Reduced transconductance

3.

In CMOS logic, the static power dissipation mainly occurs due to?

a)

Switching activity

b)

Leakage current through transistors

c)

Short-circuit current during transitions

d)

Load capacitance charging

4.

What is the main reason for body effect in MOSFETs?

a)

Source-bulk voltage causes a change in threshold voltage

b)

Drain-bulk junction leakage

c)

Gate capacitance variation

d)

Channel-length modulation

5.

Which among the following reduces dynamic power consumption in CMOS circuits?

a)

Increasing supply voltage

b)

Reducing load capacitance

c)

Using smaller channel lengths

d)

Increasing switching frequency

6.

The primary function of the stick diagram in VLSI layout design is to?

a)

Estimate power dissipation

b)

Show actual dimensions of layout

c)

Represent topological structure before physical layout

d)

Represent timing information

7.

In a CMOS inverter, the noise margin reaches its highest value when?

a)

Both transistors have identical threshold voltages and the same carrier mobility.

b)

The threshold voltages of the n-channel and p-channel transistors are equal in magnitude but opposite in sign, and their drive strengths are properly balanced by sizing.

c)

Both transistors have the same physical width.

d)

The transistors operate at different threshold voltages but equal current capacities.

8.

Which of the following layout rules ensures protection against latch-up?

a)

Increasing metal width

b)

Using guard rings around transistors

c)

Reducing substrate contact

d)

Using longer channels

9.

In a modern CMOS digital circuit, the dynamic power dissipation primarily arises from charging and discharging internal and load capacitances. Which of the following design choices would most effectively reduce dynamic power consumption without significantly degrading performance?

a)

Reducing the transistor threshold voltages to allow faster switching.

b)

Increasing the channel widths of transistors to lower their resistance.

c)

Decreasing the supply voltage and optimizing the circuit to maintain acceptable switching speed.

d)

Using larger load capacitances to improve signal integrity and noise margins.

10.

Which fabrication step defines the transistor channel region?

a)

Oxidation

b)

Lithography

c)

Diffusion

d)

Ion implantation

11.

In static CMOS design, the pull-up and pull-down networks are arranged?

a)

Complementary such that one conducts when the other is off

b)

In parallel with complementary signals

c)

In series with common gate inputs

d)

Using same polarity transistors

12.

Which of the following parameters decreases as channel length decreases in MOSFETs?

a)

Drain resistance

b)

Gate capacitance

c)

Threshold voltage

d)

Saturation current

13.

The function of a design rule checker (DRC) in VLSI CAD flow is to?

a)

Check timing violations

b)

Verify logic functionality

c)

Ensure layout geometry adheres to process constraints

d)

Optimize area and power

14.

In deep submicron VLSI, which interconnect parameter becomes dominant for delay?

a)

Resistance

b)

Capacitance

c)

Inductance

d)

Crosstalk noise

15.

The ratio of PMOS to NMOS width in a CMOS inverter is typically chosen to?

a)

Equalize rise and fall times

b)

Minimize leakage

c)

Reduce area

d)

Increase drive strength