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2nd yr week 1 edc

Total questions: 35

Worksheet time: 18mins

Name
Class
Date
1.

What is the value of the electronic charge used in the calculations?

a)

1.6 × 10⁻¹⁹ C

b)

1.6 × 10⁻¹⁸ C

c)

1.6 × 10⁻²⁰ C

d)

1.6 × 10⁻¹⁷ C

2.

What is the typical value of the diffusion constant (Dn) for electrons in silicon at 300 K?

a)

35 cm²/s

b)

25 cm²/s

c)

15 cm²/s

d)

45 cm²/s

3.

What is the typical value of the carrier mobility for electrons in silicon at 300 K?

a)

0.13 m²/V-s

b)

0.03 m²/V-s

c)

1.3 m²/V-s

d)

0.013 m²/V-s

4.

What is the intrinsic carrier density of silicon at 300 K?

a)

1.5 × 10¹⁰/cm³

b)

2.25 × 10¹⁵/cm³

c)

1.5 × 10¹⁵/cm³

d)

1.0 × 10⁵/cm³

5.

What is the bandgap of silicon at room temperature?

a)

1.1 eV

b)

0.7 eV

c)

1.3 eV

d)

1.4 eV

6.

What is the unit of resistivity?

a)

Ω-cm

b)

Ω-m

c)

Ω

d)

Ω/cm

7.

What is the typical value of the diffusion constant (Dn) in the base of a bipolar transistor?

a)

25 cm²/s

b)

35 cm²/s

c)

15 cm²/s

d)

45 cm²/s

8.

What is the longest wavelength that can be absorbed by silicon with a bandgap of 1.12 eV?

a)

1.1 μm

b)

0.87 μm

c)

1.5 μm

d)

0.5 μm

9.

What is the typical value of the donor impurity concentration (N_D) in a uniformly doped n-type silicon sample?

a)

2.5 × 10¹⁵/cm³

b)

2 × 10¹⁶/cm³

c)

1 × 10¹⁶/cm³

d)

2 × 10¹⁵/cm³

10.

What is the primary reason for the widespread use of Silicon in semiconductor device technology?

a)

Abundance of Silicon on the surface of the Earth

b)

Larger bandgap of Silicon in comparison to Germanium

c)

Favorable properties of Silicon-dioxide (SiO₂)

d)

Lower melting point

11.

A Silicon sample A is doped with 10¹⁸ atoms/cm³ of Boron. Another sample B of identical dimensions is doped with 10¹⁸ atoms/cm³ of Phosphorus. The ratio of electron to hole mobility is 3. The ratio of conductivity of the sample A to B is

a)

3

b)

1/3

c)

2/3

d)

3/2

12.

The concentration of minority carriers in an extrinsic semiconductor under equilibrium is

a)

Directly proportional to the doping concentration

b)

Inversely proportional to the doping concentration

c)

Directly proportional to the intrinsic concentration

d)

Inversely proportional to the intrinsic concentration

13.

The majority carriers in an n-type semiconductor have an average drift velocity v in a direction perpendicular to a uniform magnetic field B. The electric field E induced due to Hall effect acts in the direction

a)

v × B

b)

B × v

c)

Along v

d)

Opposite to v

14.

A heavily doped n-type semiconductor has a hole-electron mobility ratio of 0.4, doping concentration of 4.2 × 10¹⁸ atoms/m³, and intrinsic concentration of 1.5 × 10⁴ atoms/m³. The ratio of conductance of the n-type semiconductor to that of the intrinsic semiconductor of same material and at the same temperature is

a)

0.00005

b)

2,000

c)

10,000

d)

20,000

15.

The electron and hole concentrations in an intrinsic semiconductor are nᵢ per cm³ at 300 K. If acceptor impurities are introduced with a concentration of N_A per cm³ (where N_A >> nᵢ), the electron concentration per cm³ at 300 K will be

a)

nᵢ

b)

nᵢ + N_A

c)

N_A - nᵢ

d)

nᵢ² / N_A

16.

Which of the following is true?

a)

A silicon wafer heavily doped with boron is a p⁺ substrate

b)

A silicon wafer lightly doped with boron is a p⁺ substrate

c)

A silicon wafer heavily doped with arsenic is a p⁺ substrate

d)

A silicon wafer lightly doped with arsenic is a p⁺ substrate

17.

The ratio of the mobility to the diffusion coefficient in a semiconductor has the unit

a)

V⁻¹

b)

cm·V⁻¹

c)

V·cm⁻¹

d)

V·s

18.

Which type of current dominates for minority carriers under low level injection in an extrinsic semiconductor?

a)

Drift current

b)

Diffusion current

c)

Recombination current

d)

Induced current

19.

If the ratio of electron to hole mobility is 3, and the conductivity ratio of sample A to B is 2/3, which sample is doped with boron?

a)

Sample A

b)

Sample B

c)

Both

d)

Neither

20.

Which of the following is a property of Silicon-dioxide (SiO₂) that makes it favorable for semiconductor technology?

a)

High melting point

b)

Good insulator

c)

High conductivity

d)

Magnetic property

21.

If a silicon wafer is heavily doped with boron, what type of substrate is formed?

a)

n-type

b)

p-type

c)

p⁺ substrate

d)

n⁺ substrate

22.

What happens to the Fermi level of silicon when doped with boron compared to undoped silicon?

a)

It goes up

b)

It goes down

c)

It remains unchanged

d)

It becomes zero

23.

What is the effect of acceptor impurities on the electron concentration in an intrinsic semiconductor?

a)

Increases it

b)

Decreases it

c)

No effect

d)

Makes it zero

24.

If the doping concentration is much greater than the intrinsic carrier concentration, the minority carrier concentration is approximately

a)

Equal to the doping concentration

b)

Equal to the intrinsic concentration squared divided by the doping concentration

c)

Zero

d)

Double the intrinsic concentration

25.

What is the typical value of kT/q at 300 K?

a)

13 mV

b)

25 mV

c)

50 mV

d)

100 mV

26.

What is the effect on the Fermi level when silicon is doped with boron?

a)

It moves closer to the conduction band

b)

It moves closer to the valence band

c)

It remains at the intrinsic level

d)

It becomes undefined

27.

A silicon sample with unit cross-sectional area is shown in thermal equilibrium. The following information is given: T = 300 K, electronic charge = 1.6 × 10⁻¹⁹ C, thermal voltage = 26 mV, and electron mobility = 1350 cm²/V·s. What is the value of the donor concentration N_D in the sample?

a)

10¹⁶/cm³

b)

10¹⁷/cm³

c)

10¹⁸/cm³

d)

10¹⁹/cm³

28.

The magnitude of the electric field at x = 0.5 μm is

a)

1 kV/cm

b)

5 kV/cm

c)

10 kV/cm

d)

26 kV/cm

29.

The magnitude of the electron drift current density at x = 0.5 μm is

a)

2.16 × 10⁴ A/cm²

b)

1.08 × 10⁴ A/cm²

c)

4.32 × 10³ A/cm²

d)

6.48 × 10² A/cm²

30.

A silicon bar is doped with donor impurities N_D = 2.25 × 10¹⁵ atoms/cm³. Given the intrinsic carrier concentration of silicon at T = 300 K is nᵢ = 1.5 × 10¹⁰ cm⁻³. Assuming complete impurity ionization, the equilibrium electron and hole concentrations are

a)

n₀ = 1.5 × 10¹⁶ cm⁻³, p₀ = 1.5 × 10⁵ cm⁻³

b)

n₀ = 1.5 × 10¹⁰ cm⁻³, p₀ = 1.5 × 10¹⁵ cm⁻³

c)

n₀ = 2.25 × 10¹⁵ cm⁻³, p₀ = 1.5 × 10⁵ cm⁻³

d)

n₀ = 2.25 × 10¹⁵ cm⁻³, p₀ = 10⁵ cm⁻³

31.

What is the effect of increasing temperature on the intrinsic carrier concentration in silicon?

a)

It decreases

b)

No effect

c)

It increases

d)

It becomes zero

32.

In a p-type semiconductor, what is the majority carrier type?

a)

Holes

b)

Both

c)

Neither

d)

Electrons

33.

What happens to the conductivity of silicon when it is doped with a higher concentration of donor impurities?

a)

It increases

b)

It decreases

c)

It remains the same

d)

It becomes zero

34.

In a p-type semiconductor, what happens to the Fermi level as the temperature increases?

a)

It becomes undefined

b)

It remains constant

c)

It moves closer to the valence band

d)

It moves closer to the conduction band

35.

What is the effect of increasing doping concentration on the mobility of charge carriers in a semiconductor?

a)

It increases

b)

It decreases

c)

It becomes zero

d)

No effect