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WorksheetsDiode and Semiconductor Fundamentals
Total questions: 30
Worksheet time: 15mins
For an ideal p–n junction germanium diode with reverse saturation current Is=10μA at 300 K, what forward-bias voltage is needed to produce 100mA forward current? Use q=1.6×10−19C and k=1.38×10−23J/K .
0.38 V
0.26 V
0.10 V
0.98 V
The diode equation for forward current in an ideal p–n junction is I=Is(eqV/(kT)−1) . When I ≫ I_s, which simplified expression most appropriately estimates V?
V ≈ (kT/q) ln(I·I_s)
V ≈ (kT/q) (I/I_s)
V ≈ (q/kT) ln(I/I_s)
V ≈ (kT/q) ln(I/I_s)
At T = 300 K, the thermal voltage V_T = kT/q is approximately which value?
0.062 V
0.0062 V
0.026 V
0.16 V
A PN-junction solar cell delivers photocurrent IL=1 mA . At its maximum power point, the terminal voltage is Vm=0.3 V and the thermal voltage is VT=30 mV . Assuming the one-diode model with I=IL−I0(eV/VT−1) , what is the reverse saturation current I0 ?
41.3 nA
1.00 nA
0.41 nA
4.13 nA
In a solar cell modeled by the single diode equation I=IL−I0(eV/VT−1) , increasing V_T while keeping V_m fixed and I_L constant will have what qualitative effect on the required I_0 to satisfy I(V_m) = 0?
I_0 increases because eVm/VT decreases
I_0 decreases because eVm/VT decreases
I_0 unchanged because V_m is fixed
I_0 becomes zero at any V_T
The intrinsic carrier concentration of a semiconductor is ni=2.5×1016m−3 at 300 K. Electron and hole mobilities are μn=0.15m2/V⋅s and μp=0.05m2/V⋅s . Taking q=1.6×10−19C , what is the intrinsic resistivity ρ ?
1.65 kΩ·m
1.25 kΩ·m
0.85 kΩ·m
1.95 kΩ·m
Using σ=qni(μn+μp) , what is the intrinsic conductivity for the semiconductor with ni=2.5×1016m−3 , μn=0.15m2/V⋅s , μp=0.05m2/V⋅s ?
8.0 × 10−4 S/m
2.0×10−4 S/m
8.0 × 10−3 S/m
2.0×10−3 S/m
Which parameter primarily sets the exponential slope of the diode I–V characteristic in the ideal diode equation?
Thermal voltage kT/q
Series resistance of leads
Junction capacitance value
Reverse breakdown voltage
A germanium diode and a silicon diode have the same reverse saturation current I_s at 300 K. For the same forward current I ≫ I_s, which statement about required forward voltage is most accurate?
Both need zero V in practice
Silicon needs lower V always
Germanium needs higher V always
Both need nearly same V if ideal
If the intrinsic carrier concentration n_i doubles while mobilities remain constant, how does intrinsic resistivity ρ = 1/(q n_i (μ_n+μ_p)) change?
It halves
It doubles
It remains same
It increases fourfold
For a diode with I_s = 10 μA at 300 K, what forward current corresponds to V = 0.238 V assuming I ≫ I_s? Use V_T = 25.9 mV.
≈1 A
≈100 mA
≈10 mA
≈1 mA
Which element is a suitable n-type dopant when added to crystalline silicon?
Boron from group III acceptors
Gallium from group III acceptors
Phosphorus from group V donors
Indium from group III acceptors
In an n-type semiconductor, the donor level ED is 0.25 eV below the conduction band edge EC. Which statement best describes the position of EF if ED − EF = 0.18 eV?
EF lies 0.43 eV below EC
EF lies 0.18 eV above EC
EF lies 0.07 eV below EC
EF coincides exactly with EC
Five percent of donor atoms remain neutral in an n-type semiconductor. What fraction of donor atoms are ionized?
Ninety-five percent of donors
One hundred percent of donors
Fifty percent of donors
Five percent of donors
For a donor level with degeneracy factor g = 2, which term appears in the expression for electrons occupying the donor level nd = 1 + g exp[(kT ED − EF)] Nd?
A factor accounting for level degeneracy
A term for lattice vibration energy
A correction for bandgap narrowing
A coefficient for recombination velocity
Given EC − EF = 0.25 eV and ED − EF = 0.07275 eV from VT ln(38), what is the numerical value of EC − ED?
0.17725 eV difference
0.32275 eV difference
0.07275 eV difference
0.25000 eV difference
In an extrinsic semiconductor, the hole concentration is p=1.5ni where ni is the intrinsic carrier concentration. Using mass action ( np=ni2 ), what is the electron concentration n ?
n equals (ni / 1.5)
n equals (1.5×ni2)
n equals (1.5 × ni)
n equals (ni2/1.5)
If equal drift currents are carried by electrons and holes (Jn = Jp) under the same electric field, which relation between mobilities holds when p = 1.5 ni and n = (ni/1.5)?
μn / μp = 1.00
μn / μp = 2.25
μn / μp = 0.67
μn / μp = 1.50
Thermal voltage VT is approximated as 20 mV at room temperature. Which expression correctly uses VT to relate ED − EF when the occupation ratio gives exp[(ED − EF)/kT] = 38?
ED − EF = VT ln 38
ED − EF = q VT 38
ED − EF = 38 / VT
ED − EF = VT / ln 38
For an intrinsic semiconductor at absolute zero (T = 0 K), which statement is correct about band occupancy?
All valence band states are empty, conduction band states are filled
All valence band states are filled, conduction band states are empty
Both valence and conduction band states are filled with electrons
Both valence and conduction band states are filled with holes
In a non-degenerate semiconductor at 300 K, the relation between electron concentration n, the conduction band edge Ec, and the electron quasi-Fermi level EFn is n=Ncexp[−(Ec−EFn)/kT] . If Nc=1019 cm−3 and Ec−EFn=0.2 eV , what is n? Use kT≈0.026 eV .
1.9×10^16 cm−3
1.0×10^15 cm−3
3.7×1017cm−3
2.1×1015cm−3
9.6×10^18 cm−3
For two non-degenerate samples at the same temperature with electron densities n1 and n2 and identical Nc, the difference (Ec − EF1) − (Ec − EF2) equals kT ln(n2/n1). If n2 = 0.5 n1 and kT = 26 meV, what is (Ec − EF1) − (Ec − EF2)?
−26 meV
−18 meV
+18 meV
+26 meV
−45 meV
The intrinsic Fermi level Ei in a semiconductor with effective density of states Nc and Nv is offset from midgap by Δ = (kT/2) ln(Nv/Nc). If Nv = 2Nc at 300 K and kT = 26 meV, what is |Δ|?
32.00 meV
26.90 meV
18.02 meV
13.45 meV
9.01 meV
Which statement best explains why Ei shifts toward the band with larger effective density of states?
Larger DOS increases entropy near that band
Larger DOS raises bandgap energy significantly
Larger DOS reduces carrier lifetimes dramatically
Larger DOS eliminates non-radiative recombination
Larger DOS lowers temperature dependence entirely
A silicon sample at 300 K has Nd = 5×1016cm−3 and is uniformly illuminated with optical generation rate Gopt = 1.5×1020cm−3s−1 . Under low-level injection, what is the steady-state excess minority hole concentration Δp0 if τp0 = 0.1μs ?
7.5×1014cm−3
1.5×10^12 cm−3
1.5×10^13 cm−3
7.5×1013cm−3
1.5×10^14 cm−3
After the light is turned off at t = 0, the excess minority holes in the sample of the previous question decay as Δp(t) = Δp0e−t/τp0 . With Δp0 from steady state and τp0=0.1μs , what is Δpatt=0.3μs ?
7.46×1012cm−3
1.11×10^13 cm−3
4.98×1012cm−3
1.50×10^13 cm−3
3.33×1012cm−3
For n-type silicon with Nd ≫ ni and low-level injection, which approximation is most appropriate for the majority carrier concentration n0?
n0 ≈ Δn = Δp
n0 ≈ Nd (complete ionization)
n0 ≈ ni (intrinsic level)
n0 ≈ Nd−Ndni2−Δp
n0 ≈ Nv (valence DOS)
Given ni = 1010cm−3 at 300 K, Nc = 1019cm−3 , and n = 1016cm−3 , compute Ec − EFn using Ec − EFn = kTln(nNc) with kT=26meV .
286 meV
260 meV
234 meV
208 meV
104 meV
If Nv/Nc = 0.5 at 300 K, what is the direction of Ei shift relative to midgap and its magnitude? Use Δ = (kT/2) ln(Nv/Nc) with kT = 26 meV.
No shift at any temperature
Toward Ec by 13.45 meV
Toward Ec by 9.01 meV
Toward Ev by 9.01 meV
Toward Ev by 13.45 meV
A sample has τp0 = 0.1 μs and τn0 = 0.5 μs under low-level injection. Which plot of Δp(t) correctly represents the transient after the light is turned off at t = 0?
Exponential decay with time constant 0.1 μs
Exponential decay with time constant 0.5 μs
Constant value equal to Δp0 forever
Exponential rise with time constant 0.1 μs
Linear decay to zero in 0.1 μs
