ECE411_Oxidation

The thickness of the grown silicon dioxide is ........ that of the consumed silicon.

• double

• half

• triple

• quadruple

How many zones are there in the oxidation furnace?

• 1

• 2

• 3

• 4

Which type of isolation is preferred in modern technologies?

• LOCOS

• junction isolation

• trench isolation

What type of dielectrics do we need for gate oxide and interlayer dielectrics respectively?

• GO: low-k

  ILD: low-k

• GO: low-k

  ILD: high-k

• GO: high-k

  ILD: low-k

• GO: high-k

  ILD: high-k

Oxides are needed for

• Passivation

• Gate oxide

• Making resistors