Who developed the first integrated circuit in the 1950s?

• Jack Kilby

• None of the above

• Robert Noyce

• Both Jack Kilby and Robert Noyce

Which classification of integrated circuit includes up to 100 electronic components per chip?

• MSI

• LSI

• SSI

• VLSI

What is the current technology used to make microprocessors?

• Deep-ultraviolet lithography

• Laser technology

• Extreme-ultraviolet lithography

• Photography

What is the key to creating more powerful microprocessors?

• Number of mirrors used

• Size of the light's wavelength

• Type of semiconductor material

• Amount of photoresist used

Who predicted the phenomenon of the number of transistors on a microprocessor doubling every 18 months?

• Robert Noyce

• Bill Gates

• Jack Kilby

• Gordon Moore

What is the advantage of being a member of the EUV LLC consortium?

• Guaranteed profits from chip sales

• Free training on chipmaking techniques

• Access to advanced chipmaking technology

• Exclusive rights to EUV lithography patents

What is the process used to create the mask for EUV lithography?

• Transferred onto a substrate using a plasma

• Patterned onto a mirror using an absorber

• Printed onto a film using a laser

• Projected onto a silicon wafer using lenses

What is the wavelength of light used in deep-ultraviolet lithography as of 2001?

• 240 nanometers

• 100 nanometers

• 193 nanometers

• 13 nanometers

What is the main advantage of using EUV lithography over deep-ultraviolet lithography?

• Use of concave and convex mirrors

• Ability to work in a vacuum

• Shorter wavelength of light

• Coating of mirrors with molybdenum and silicon

What is the main challenge in EUV lithography related to the mirrors?

• Maintaining nearly perfect mirror surfaces

• Focusing the light onto the mask

• Reducing the absorption of EUV light

• Creating a plasma from xenon gas