PGTs & GETs QUIZ GENERAL

PGTs & GETs QUIZ GENERAL

Professional Development

10 Qs

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PGTs & GETs QUIZ GENERAL

PGTs & GETs QUIZ GENERAL

Assessment

Quiz

Professional Development

Professional Development

Practice Problem

Easy

Created by

Vicky Mbbs

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10 questions

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1.

MULTIPLE CHOICE QUESTION

1 min • 1 pt

What is the primary purpose of a clean room in an OSAT plant?

To maintain a controlled environment with minimal contaminants
To increase the production speed
To improve the visual aesthetics of the production area
To reduce the cost of raw materials

2.

MULTIPLE CHOICE QUESTION

1 min • 1 pt

Which class of clean room environment is considered to have the highest level of cleanliness?

Class 1000
Class 10,000
Class 1,000,000
Class 100

3.

MULTIPLE CHOICE QUESTION

1 min • 1 pt

What is a common method for controlling electrostatic discharge (ESD) in a semiconductor manufacturing environment?

Using anti-static wrist straps and mats
Increasing the room temperature
Enhancing the visual inspection processes
Reducing the use of electronic equipment

4.

MULTIPLE CHOICE QUESTION

1 min • 1 pt

Which of the following is a key requirement for personnel working in a clean room?

Wearing proper clean room garments
Using personal electronic devices freely
Consuming food and drinks within the clean room
Wearing regular work clothes

5.

MULTIPLE CHOICE QUESTION

1 min • 1 pt

What does the term "clean room classification" refer to?

The standards that define the maximum allowable level of particulate contamination
The classification of employees based on their roles
The type of machinery used in the clean room
The size of the clean room

6.

MULTIPLE CHOICE QUESTION

1 min • 1 pt

In the context of ESD control, what is the function of an ESD floor mat?

To dissipate electrostatic charges from personnel and equipment
To increase the durability of the floor surface
To enhance the aesthetics of the work area
To provide additional cushioning for equipment

7.

MULTIPLE CHOICE QUESTION

1 min • 1 pt

Which of the following processes is commonly used to remove contaminants from semiconductor surfaces in an OSAT plant?

Chemical cleaning
Mechanical polishing
Thermal annealing
Electrical testing

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