Microfabrication and Nanofabrication Quiz

What is the primary difference between microfabrication and nanofabrication?

• The use of chemical processes

• The scale of structures being fabricated

• The type of materials used

• The industry in which they are applied

Which of the following is a key application of microfabrication?

• Quantum dots

• Microelectromechanical systems (MEMS)

• DNA origami

• Atomic force microscopy (AFM)

Which lithography technique uses focused electron beams to achieve nanometer-scale resolution?

• Photolithography

• Electron Beam Lithography (EBL)

• Nanoimprint Lithography (NIL)

• Scanning Probe Lithography

In microfabrication, what is the purpose of doping?

• To deposit thin films

• To introduce impurities and modify electrical properties

• To etch patterns on the substrate

• To physically mold nanostructures

Which process is commonly used in nanofabrication to deposit materials at an atomic scale?

• Atomic Layer Deposition (ALD)

• Wet Etching

• Physical Vapor Deposition (PVD)

• Photolithography

What limits the resolution of photolithography in microfabrication?

• The type of substrate

• The wavelength of light used

• The thickness of the photoresist

• The chemical composition of the etching solution

Which of the following is a self-assembly technique used in nanofabrication?

• Focused Ion Beam (FIB)

• Scanning Tunneling Microscopy (STM)

• Block copolymers

• Dry etching

What is the primary function of etching in microfabrication?

• To add impurities to the material

• To remove unprotected material selectively

• To deposit thin films on the substrate

• To measure atomic-scale features

Nanoimprint lithography (NIL) is best described as:

• A high-speed, cost-effective process for patterning nanoscale structures

• A technique using electron beams to create nanostructures

• A method for introducing impurities into silicon wafers

• A process for imaging atomic-scale structures

What is one major challenge in nano fabrication?

• Inability to achieve high resolution

• High equipment costs and process complexity

• Lack of applications in emerging industries

• Unavailability of compatible substrates