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MOS Transistor quiz 1

Total questions: 20

Worksheet time: 41mins

Name
Class
Date
1.

The n-type semiconductor have _______ as majority carriers

a)

Holes

b)

Ions

c)

electrons

d)

positive ions

2.

The n-MOS transistor is made up of

a)

N-type source, n-type drain and p-type bulk

b)

N-type source, p-type drain and p-type bulk

c)

P-type source, n-type drain and n-type bulk

d)

P- type source, p-type drain and n-type bulk

3.

The correct representation of p-MOSFET is

a)
b)
c)
d)
4.

The oxide layer formed in the MOSFET is

a)

Oxides of Non metals

b)

Poly Silicon oxide

c)

Silicon dioxide

d)

Metal oxide

5.

Which of the following terminals does not belong to the MOSFET?

a)

Drain

b)

Gate

c)

Base

d)

Source

6.

A MOSFET has …………… terminals

a)

4

b)

3

c)

5

d)

2

7.

A MOSFET uses the electric field of a ………. to control the channel current

a)

battery

b)

generator

c)

capacitor

d)

all the above

8.

MOSFET can be used as ________

a)

Voltage controlled capacitor

b)

Current controlled capacitor

c)

Voltage controlled inductor

d)

Current controlled inductor

9.

The effective channel length of a MOSFET in saturation decreases with increase in which of the following parameter?

a)

Gate voltage

b)

Drain voltage

c)

Source voltage

d)

Body voltage

10.

For a p channel MOSFET which of the following is not true?

a)

The source and drain are a p type semiconductor

b)

The induced channel is p type region which is induced by applying a positive potential to the gate

c)

The substrate is a n type semiconductor

d)

None of the above

11.

The conductivity of the pure silicon is raised by

a)

Increasing Pressure

b)

Decreasing Temperature

c)

Introducing Dopants (impurities)

d)

Deformation of Lattice

12.

nMOS devices are formed in

a)

p-type substrate of high doping level

b)

n-type substrate of low doping level

c)

p-type substrate of moderate doping level

d)

n-type substrate of high doping level

13.

Source and drain in nMOS device are isolated by

a)

a single diode

b)

four diodes

c)

three diodes

d)

two diodes

14.

The condition for non saturated region is

a)

Vds lesser than Vgs – Vt

b)

Vds greater than Vgs – Vt

c)

Vds = Vgs – Vt

d)

Vgs lesser than Vt

15.

The condition for linear region is

a)

Vgs lesser than Vt

b)

Vgs greater than Vt

c)

Vds lesser than Vgs

d)

Vds greater than Vgs

16.

__________ network to connect the output of 1

a)

pMOS pull up

b)

CMOS

c)

nMOS pull down

d)

all the above

17.

when gate is ___________ nMOS transistor is ON

a)

low

b)

high

c)

high impendence

d)

low or high

18.

By moore's law the transistor count doubling every _______ months

a)

24

b)

20

c)

10

d)

18

19.

In MOS structure for the condition Vg > Vt it will in ___________

a)

inversion region

b)

accumulation region

c)

depletion region

d)

all the above

20.

nMOS transistor the Ids value is '0' for ______________

a)

linear region

b)

cutoff region

c)

saturation region

d)

unsaturated region